TERA-Fab E-Series Beam Pen Lithography
The TERA-print TERA-Fab E-Series Beam Pen Lithography (BPL) tool is used for patterning micro- and nanoscale devices, direct-writing into photoresist --or any photoactive film-- on myriad substrates.
BPL uses a large array of apertured probes aligned with a digital light processing (DLP) module to independently control up to hundreds of thousands of microbeams of light. The resolution is defined by probe aperture size; by making the apertures small enough, sub-diffraction limit resolution can be achieved. Each probe can create an individual pattern with a resolution down to less than 250 nm. Conductive substrates are required for BPL.
By incorporating a digital micromirror device (DMD), all probes in the array can work in concert to stitch larger scale designs seamlessly, with feature sizes greater than 1.25 µm. Conductive substrates are not required for DMD mode lithography.
Supported file types: PNG, JPG, BMP