Heidelberg µPG-101 Mask Writer
The Heidelberg Instuments µPG-101 is a benchtop pattern generator that is configured with a 375 nm laser diode, which allows for exposure of both positive and negative resists. The tool can be used to create photomasks for use with our UV flood source, and to direct-write into resist films on a silicon wafer.
Two write modes are available. Write Mode I provides a 0.6 µm minimum feature size (50 x 50 mm write area). Write Mode III provides a 2.5 µm minimum feature size (125 x 125 mm write area). Both write modes can be combined for a single design with small features over a large area.
This tool is not accessible to users. Contact Ryan Grigsby at ryan.grigsby@ku.edu to have a mask blank or coated wafer patterned by this tool.