Plasma Reactors
Plasma Etch PE-50HF
The Plasma Etch PE-50HF is a 13.56 MHz plasma asher, used to strip photoresist from wafers for re-use. This plasma cleaner is currently plumbed to strike either oxygen or air plasmas.
Plasma Etch PE-50 Plasma Reactor
The Plasma Etch PE-50 is used to clean substrates prior to film deposition or to etch shallow features in various materials. This plasma cleaner is currently plumbed to strike either oxygen or air plasmas.
To access the Standard Operating Procedure for the PE-50 Plasma Reactor, please click here.
Harrick PDC-32G Plasma Cleaner
The Harrick plasma cleaner, like the March Plasmod above, can be used to etch or clean various materials. This unit is used particularly to treat PDMS devices for irreversible sealing and to clean glass prior to thermal bonding. It is currently plumbed to strike either oxygen or air plasmas.
To access the Standard Operating Procedure for the Harric plasma cleaner, please click here.