ABM UV Flood Source & Mask Alignment System
The ABM, Inc. i-line (365 nm) near-UV flood source produces light with an intensity of 20 mW/cm2. The automatic shutter is controlled by a timer with 0.1 s precision. An optional long-pass filter cuts out wavelengths below 345 nm.
The substrate chuck and mask frame are planarizable. Both soft contact and adjustable hard vacuum contact are possible. Chuck and frame combinations are available for 4" (square and round) and 6" (round) substrates.
The alignment system from OAI features dual inspection microscopes with CCD cameras. Stage adjustments (x, y, and Θ) can be made using 100 TPI positioners.
For detailed instructions on using the instrument, please click on the following links.
- SOP for the ABM/OAI Flood Source and Mask Aligner
- Changing the ABM Mask Frame and Substrate Chuck
- OAI UV Flood Source Calibration
- Adjustments for the OAI Mask Aligner