Nanoimprint Lithography
Nanonex NX-2500 Nanoimprinter
The Nanonex nanoimprint lithography system is used to create nano-scaled features in polymer substrates. Heat and pressure are uniformly applied to the substrate and master so that features from the master are embossed into the surface of the substrate. The imprinter is also configured with an internal UV light source for use with UV-curable resins at room temperature. An alignment module is included to help align imprinting masters over substrates with existing features.